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Specification | Content |
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Tool Name | ASTRON (Single Wafer Cleaner) |
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Model | SWC3008 | SWC3012 | SWC3016 |
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No. of Chamber | 8 | 12 | 16 |
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Max. Throughput (wf/hr) | 480 | User Spec. | User Spec. |
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Dimension (mm) | Width | 2,230 | 2,300 | 2,300 |
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Length | 2,165 | 2,760 | 2,760 |
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Height | 3,150 | 2,450 | 3,150 |
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Usage | Cleaning & Etching |
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Wafer Size | 300mm (200mm Option) |
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No. of Loadport | 3 or 4 |
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FA | OHT, AGV |
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Chemical | Acid, Alkali, IPA, Hot DIW, DIW |
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Robots | 2 for EFEM & Main (MTR) |
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Chemical Injection | Front & Backside together |
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Dry | IPA liquid + N2 |
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Options | Megasonic, Nanospray |
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Uniformity | 5% |
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